Molecular Vista
Vista 200 Atomic Force Microscope
The Vista 200 delivers sub-5 nm IR spatial resolution with non-destructive PiFM and PiF-IR nanospectroscopy for wafers and masks, combining true non-contact AFM performance with integrated environmental control for maximum stability and precision.
Specifications
Stage and Scanner
- Sample stage travel: 200 mm × 200 mm square
- Scan size: 120 µm × 120 µm
- Dual Z Feedback: 12 µm z-scanner with 600 nm fast-z scanner
Functionality
- Imaging modes: Non-contact AFM, PiFM, KPFM, cAFM, nano DMA, FvD (force vs distance) mapping
- Spectroscopy modes: PiF-IR, FvD
- Laser Options: QCL (770–1840, 1995–2395 cm−1), OPO/DFG (590–2050, 2250–4400, 5000–7000 cm−1)
- Depth probed (IR): ~20 nm surface mode, >100 nm bulk mode
Physical Requirements
- System dimensions: Requires a 1.2 m × 1.8 m (4 ft × 6 ft) optical breadboard
- Enclosure: 300 mm × 200 mm access door; enclosure removable without disconnecting cables
Environmental / System Features
- Built-in vibration isolation
- Temperature-controlled acoustic enclosure (0.1 °C stability)
- Fully enclosed, dry-air beam path
- Self-contained system; no special lab environment required
Sample Handling / Industry Features
- Vacuum chuck and EUV mask holder options
- Support for 4-, 6-, and 8-inch wafers
- Forward-moving stage and easy tip/sample exchange
- 300 mm-wide door for minimal thermal drift
- VistaScan™ provides an integrated acquisition and analysis workflow, including a scripting API for custom measurement
Applications
- Semiconductor and nanofabrication failure analysis
- Polymer, composite, and biomaterial characterization
- 2D materials and thin-film research
- Surface contamination and defect analysis
- Chemical phase mapping of heterogeneous materials
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