Anfatec Instruments AG
Measurement Science and Technology &
Scanning Probe Microscopy

Conductive Calibration Grating UMG03/PtSi


Typical applications

→ defined height steps of 55 nm checked with TEM cross section

→ lateral overview calibration for smaller scan ranges

This grating was developed for the height calibration of scanners, however, its chess pattern like structure makes it suitable for the lateral calibration, too.



Description

Type / Material : Si-substrate with an overall 5-10 nm PtSi layer
Typical height : 55 nm +/- 3 nm
Depth calibration : TEM cross section
Center pitch* : 2 µm x 2 µm (chess pattern 1 µm x 1 µm)
Center dimensions : 0,4 mm x 0,4 mm
Edge pitch x : 2 µm x 2 µm (chess pattern 1 µm x 1 µm)
Edge pitch y : 4 µm Si / 100 µm SiO2
Active area : 2,4 mm x 2,4 mm

* equals periodicity of the gratings



Grating dimensions:


1: flat, no structures, 5-10 nm PtSi
2: grating edge, line pattern, 5-10 nm PtSi
3: grating center, chess pattern, 5-10 nm PtSi


Grating structures in the central area

Grating structures in the outer area

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