Conductive Calibration Grating UMG03/PtSi


Typical applications

  • defined height steps of 55 nm checked with TEM cross section

  • lateral overview calibration for smaller scan ranges

This grating was developed for the height calibration of scanners, however, its chess pattern like structure makes it suitable for the lateral calibration, too.



Description


  • Type / Material

Si-substrate with an overall 5-10 nm PtSi layer

  • Typical height

55 nm +/- 3 nm

  • Depth calibration

TEM cross section

  • Center of the grating

    • Pitch*

2 µm x 2 µm (chess pattern 1 µm x 1 µm)

    • Dimensions

0,4 mm x 0,4 mm

  • Edge of the grating

    • Pitch x

100 µm Si / 2 µm SiO2 (pitch: 4 µm)

    • Pitch y

4 µm Si / 100 µm SiO2

  • Active area

2,4 mm x 2,4 mm

* equals periodicity of the gratings



Grating dimensions:


1: flat, no structures, 5-10 nm PtSi
2: grating edge, line pattern, 5-10 nm PtSi
3: grating center, chess pattern, 5-10 nm PtSi


Grating structures in the central area:


Grating structures in the outer area: